Microscopic Theory of Electromigration on Semiconductor Surfaces
- 12 February 1996
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 76 (7) , 1114-1117
- https://doi.org/10.1103/physrevlett.76.1114
Abstract
Electromigration has a dramatic effect on the morphology of semiconductor surfaces, inducing, for example, step bunching instabilities. To explain these phenomena from a microscopic point of view, we study self-diffusion on Si(111) through first principles calculations, and propose a mechanism for diffusion bias induced by external electric fields. A competing, wind-force effect arises from enhanced surface electron density, due to incomplete melting. The competition leads to two transitions in surface kinetics with increasing temperature, in agreement with experimental observations.Keywords
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