Elimination of a DX-center by an AlAs/n-GaAs superlattice and its application to 2DEGFETs
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 4 (3) , 195-206
- https://doi.org/10.1016/0167-9317(86)90011-0
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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- Growth Condition Independence Observed for DX Center in Si-doped AlGaAs Grown by Molecular Beam EpitaxyJapanese Journal of Applied Physics, 1985
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- Chemical trends in the activation energies of D X centersApplied Physics Letters, 1984
- Elimination of Persistent Photoconductivity and Improvement in Si Activation Coefficient by Al Spatial Separation from Ga and Si in Al–Ga–As:Si Solid System –a Novel Short Period AlAs/n-GaAs Superlattice–Japanese Journal of Applied Physics, 1983
- Instabilities in modulation doped field-effect transistors (MODFETs) at 77 KElectronics Letters, 1983
- Temperature dependence of the I–V characteristics of modulation-doped FETsJournal of Vacuum Science & Technology B, 1983
- Si and Sn Doping in AlxGa1-xAs Grown by MBEJapanese Journal of Applied Physics, 1982
- Trapping characteristics and a donor-complex () model for the persistent-photoconductivity trapping center in Te-dopedPhysical Review B, 1979