Optimising control of microwave plasma bias enhanced nucleation for heteroepitaxial chemical vapour deposition diamond
- 1 April 1997
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 6 (5-7) , 676-680
- https://doi.org/10.1016/s0925-9635(96)00751-0
Abstract
No abstract availableKeywords
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