TEM in-situ observation of electromigration in A1 stripes with quasi-bamboo structure
- 16 June 1981
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 65 (2) , K107-K108
- https://doi.org/10.1002/pssa.2210650246
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- TEM in situ observation of electromigration damage in Al-Cu strips II. Superimposed AC and DC stressingPhysica Status Solidi (a), 1981
- TEM in-situ observation of electromigration damage in Al-Cu strips I. Constant DC stressingPhysica Status Solidi (a), 1981
- A model for the width dependence of electromigration lifetimes in aluminum thin-film stripesApplied Physics Letters, 1980
- Linewidth dependence of electromigration in evaporated Al-0.5%CuApplied Physics Letters, 1980