Two-dimensional electron gas transport properties in AlGaN/GaN single- and double-heterostructure field effect transistors
- 22 May 2001
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 82 (1-3) , 232-237
- https://doi.org/10.1016/s0921-5107(01)00604-3
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Recessed gate AlGaN/GaN modulation-doped field-effect transistors on sapphireApplied Physics Letters, 2000
- Superior Pinch-Off Characteristics at 400°C in AlGaN/GaN Heterostructure Field Effect TransistorsJapanese Journal of Applied Physics, 1999
- High-power microwave GaN/AlGaN HEMTs on semi-insulating silicon carbide substratesIEEE Electron Device Letters, 1999
- High Al-content AlGaN/GaN MODFETs for ultrahigh performanceIEEE Electron Device Letters, 1998
- High-power microwave 0.25-μm gate doped-channel GaN/AlGaN heterostructure field effect transistorIEEE Electron Device Letters, 1998
- DC and microwave performance of high-current AlGaN/GaN heterostructure field effect transistors grown on p-type SiC substratesIEEE Electron Device Letters, 1998
- AlGaN/GaN HEMTs grown on SiC substratesElectronics Letters, 1997
- High temperature characteristics of AlGaN/GaN modulation doped field-effect transistorsApplied Physics Letters, 1996
- Very high breakdown voltage and large transconductance realized on GaN heterojunction field effect transistorsApplied Physics Letters, 1996
- Microwave operation of GaN/AlGaN-doped channel heterostructure field effect transistorsIEEE Electron Device Letters, 1996