A simulation tool for orientation dependent etching
- 1 September 1993
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 3 (3) , 113-115
- https://doi.org/10.1088/0960-1317/3/3/004
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Anisotropic crystal etching: A simulation programSensors and Actuators A: Physical, 1992
- Morphology analysis in localized crystal growth and dissolutionJournal of Crystal Growth, 1979
- Correlation of the anisotropic etching of single−crystal silicon spheres and wafersJournal of Applied Physics, 1975
- Use of Modified Free Energy Theorems to Predict Equilibrium Growing and Etching ShapesJournal of Applied Physics, 1962