High-temperature x-ray diffraction studies on physical vapour deposited TiN
- 1 December 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 39-40, 397-408
- https://doi.org/10.1016/0257-8972(89)90072-8
Abstract
No abstract availableThis publication has 23 references indexed in Scilit:
- Mechanical properties, structure and performance of chemically vapor-deposited and physically vapor-deposited coated carbide toolsMaterials Science and Engineering: A, 1988
- Low temperature tempering-induced changes in bulk resistivity, temperature coefficient of resistivity and stress in physically vapor-deposited TiNSurface and Coatings Technology, 1988
- Physical vapor-deposited TiN on cemented carbide: Tempering effectsSurface and Coatings Technology, 1988
- Correlation of process and system parameters with structure and properties of physically vapour- deposited hard coatingsThin Solid Films, 1988
- Nitrogen, oxygen, and argon incorporation during reactive sputter deposition of titanium nitrideJournal of Vacuum Science & Technology B, 1987
- High Temperature microhardness of hard coatings produced by physical and chemical vapor depositionThin Solid Films, 1987
- High-temperature stress measurement on chemical-vapor-deposited tungsten silicide and tungsten filmsJournal of Applied Physics, 1987
- Tempering effects in ion-plated TiN films: Texture, residual stress, adhesion and colourThin Solid Films, 1987
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film compositionThin Solid Films, 1983