Electron trapping levels in silicon dioxide thermally grown on silicon
- 1 January 1972
- journal article
- Published by Elsevier in Journal of Physics and Chemistry of Solids
- Vol. 33 (12) , 2197-2216
- https://doi.org/10.1016/s0022-3697(72)80296-8
Abstract
No abstract availableThis publication has 35 references indexed in Scilit:
- METAL-DEPENDENT INTERFACE STATES IN THIN MOS STRUCTURESApplied Physics Letters, 1971
- THIN-OXIDE MOS CAPACITANCE STUDIES OF FAST SURFACE STATESApplied Physics Letters, 1970
- Additional bibliography of metal—Insulator—Semiconductor studiesIEEE Transactions on Electron Devices, 1968
- A bibliography of metal-insulator-semiconductor studiesIEEE Transactions on Electron Devices, 1967
- The Si-SiO2Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance TechniqueBell System Technical Journal, 1967
- Photoemission of Electrons from Silicon and Gold into Silicon DioxidePhysical Review B, 1966
- Photoemission of Electrons from Silicon into Silicon DioxidePhysical Review B, 1965
- Investigation of thermally oxidised silicon surfaces using metal-oxide-semiconductor structuresSolid-State Electronics, 1965
- Field Effect‐Capacitance Analysis of Surface States on SiliconPhysica Status Solidi (b), 1963
- An investigation of surface states at a silicon/silicon oxide interface employing metal-oxide-silicon diodesSolid-State Electronics, 1962