Investigation of the process latitude for sub-half-micron pattern replication in X-ray lithography
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 339-342
- https://doi.org/10.1016/0167-9317(91)90107-o
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Resist Modeling Near Resolution And Sensitivity Limits In X -Ray LithographyPublished by SPIE-Intl Soc Optical Eng ,1989
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- The effect of beam emittances on x-ray lithography exposure line resolutionJournal of Vacuum Science & Technology A, 1987