Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate
- 17 December 1998
- journal article
- research article
- Published by American Chemical Society (ACS) in Macromolecules
- Vol. 32 (1) , 86-94
- https://doi.org/10.1021/ma981372j
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resinsPublished by Elsevier ,2003
- Revolutionary and evolutionary resist design concepts for 193 nm lithographyMicroelectronic Engineering, 1997
- Molecular Characteristics of Poly(methacrylamidod-Glucose)1Journal of Carbohydrate Chemistry, 1996
- Single-layer chemically amplified photoresists for 193-nm lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Positive, chemically-amplified aromatic methacrylate resist employing the tetrahydropyranyl protecting groupChemistry of Materials, 1991
- Chemical amplification mechanisms for microlithographyChemistry of Materials, 1991
- Tetrahydropyranyl‐ and furanyl‐protected polyhydroxystyrene in chemical amplification systemsJournal of Applied Polymer Science, 1991
- Poly[p-(formyloxy)styrene]: synthesis and radiation-induced decarbonylationMacromolecules, 1985
- Regioselective syntheses of mono-O-acylglucoses.CHEMICAL & PHARMACEUTICAL BULLETIN, 1979
- Acid Reversion Products from D-GlucoseJournal of the American Chemical Society, 1954