600-nm-Range GaInP/AlInP Strained Quantum Well Lasers Grown by Gas Source Molecular Beam Epitaxy

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Abstract
GaInP strained single quantum well (SSQW) lasers in the 630–710 nm range grown by gas source molecular beam epitaxy (GSMBE) using a novel shutter control method were systematically investigated. A good controllability in strain amount as well as good in-plane compositional homogeneity over 4-cm-long distance of the laser wafers were confirmed. For +1.1% compressive SSQW lasers (708 nm in wavelength), a very low threshold current density (J th) of 175 A/cm2 was obtained. These facts suggest that the novel shutter control method is very effective for fabricating GaInP SSQW lasers. Furthermore, the post-annealing effect on lasing characteristics of GaInP SSQW lasers was investigated. The increased p carrier density of Be-doped AlInP layers was obtained with the remarkable reduction in J th value of 633 nm tensile SSQW lasers from 850 A/cm2 to 555 A/cm2.