Phase transformations in the Cr/a-Si system during low temperature annealing
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 1063-1066
- https://doi.org/10.1016/s0022-3093(05)80305-9
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Phase sequence of silicide formation at metal-silicon interfacesVacuum, 1990
- An investigation of the optical constants and band gap of chromium disilicideJournal of Applied Physics, 1988
- Unusual room-temperature intermixing and oxidation in copper deposited on a fluorinated amorphous silicon systemApplied Physics Letters, 1988
- Solid state interaction between thin chromium films and silicon—a comparison between amorphous and single-crystal siliconThin Solid Films, 1983
- Compound formation between amorphous silicon and chromiumJournal of Applied Physics, 1980
- Phase formation in Cr-Si thin-film interactionsApplied Physics Letters, 1980
- Impurities in silicon solar cellsIEEE Transactions on Electron Devices, 1980
- Contact reactions between amorphous silicon and single-crystal metallic filmsThin Solid Films, 1978
- First phase nucleation in silicon–transition-metal planar interfacesApplied Physics Letters, 1976