The influence of the ion flux density on the properties of molybdenum films deposited from the vapour phase under simultaneous argon ion irradiation
- 1 April 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 275 (1-2) , 54-57
- https://doi.org/10.1016/0040-6090(95)07018-4
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Internal stress in thin films prepared by ion beam and vapor depositionSurface and Coatings Technology, 1994
- Material dependence of property modification in ion-assisted evaporation of iron, nickel and cobaltSurface and Coatings Technology, 1990
- Use of ion beam assisted deposition to modify the microstructure and properties of thin filmsInternational Materials Reviews, 1990
- Control of microstructure and properties of copper films using ion-assisted depositionJournal of Vacuum Science & Technology A, 1988
- Microporosity and adhesion of ion bombarded thin silicon surface filmsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Ion-beam-induced epitaxial vapor-phase growth: A molecular-dynamics studyPhysical Review B, 1987
- Control of thin film orientation by glancing angle ion bombardment during growthJournal of Vacuum Science & Technology A, 1986
- Model for ion-assisted thin-film densificationJournal of Applied Physics, 1986
- Optical and electrical properties of thin silver films grown under ion bombardmentPhysical Review B, 1986
- Ion-beam-induced texture formation in vacuum-condensed thin metal filmsThin Solid Films, 1982