Possible application of micromachine technology for nanometer lithography
- 1 September 1998
- journal article
- Published by Elsevier in Microelectronics Journal
- Vol. 29 (9) , 601-611
- https://doi.org/10.1016/s0026-2692(98)00023-8
Abstract
No abstract availableThis publication has 27 references indexed in Scilit:
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