Optical properties of sputter-deposited cerium oxyfluoride thin films
- 1 November 1993
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 32 (31) , 6303-6309
- https://doi.org/10.1364/ao.32.006303
Abstract
CeOxFy, films were made by reactive rf magnetron sputtering of Ce in Ar + O2 + CF4. Stoichiometries between CeO2 and CeO1.0F1.3 were obtained when the CF4 content lay between 0% and 9%. For wavelengths λ of >0.4 μm, the films were almost nonabsorbing, and the refractive index at λ = 0.55 μm went from 2.32 for CeO2 to 1.62 at 9% CF4. At λ < 0.4 μm and 4, the optical properties were consistent with an indirect band gap at 3.1–3.2 eV. CeO2 films could serve as intercalation hosts for Li+ ions.Keywords
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