Fabrication of 0.25-µm Patterns on a Membrane Substrate-Based X-Ray Absorber
- 1 November 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (11S) , 3058
- https://doi.org/10.1143/jjap.30.3058
Abstract
X-ray mask fabrication techniques, which are used in X-ray lithography for 0.25-µm devices, are studied in this paper. Initially, the process latitude for both the single- and trilayer processes is discussed according to the simulation results. The bottom layer thickness in the trilayer process was optimized to reduce the influence of backscattered electrons, and a proximity effect correction was introduced for the 0.25-µm pattern fabrication. In order to suppress membrane heating, a reverse-side polyvinyl alcohol (PVA) coating method was developed. The temperature was monitored with a special thermometer, and the effectiveness of the PVA coating was examined.Keywords
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