Thermodynamic and kinetic properties of indium-implanted silicon I: Moderate temperature recovery of the implant damage and metastability effects
- 1 March 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 101 (3) , 263-273
- https://doi.org/10.1016/0040-6090(83)90253-5
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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