Electromigration in thin-film interconnection lines: models, methods and results
- 31 December 1991
- journal article
- review article
- Published by Elsevier in Materials Science Reports
- Vol. 7 (4-5) , 143-220
- https://doi.org/10.1016/0920-2307(91)90005-8
Abstract
No abstract availableKeywords
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