An overview of ion beam lithography for nanofabrication
- 31 March 1992
- Vol. 43 (3) , 241-251
- https://doi.org/10.1016/0042-207x(92)90270-7
Abstract
No abstract availableThis publication has 40 references indexed in Scilit:
- Low stress silicon stencil masks for sub-100 nm ion beam lithographyMicroelectronic Engineering, 1990
- Focused ion beam technology and applicationsJournal of Vacuum Science & Technology B, 1987
- High-resolution photoluminescence studies of GaAs/GaAlAs multi-quantum-well structures grown by molecular beam epitaxySolid-State Electronics, 1986
- Integrated circuit diagnosis using focused ion beamsJournal of Vacuum Science & Technology B, 1986
- A hydrogen field ion source with focusing opticsJournal of Vacuum Science & Technology B, 1986
- Systematic design of an electrostatic optical system for ion beam lithographyJournal of Vacuum Science & Technology B, 1985
- A focused ion beam system for submicron lithographyJournal of Vacuum Science & Technology B, 1985
- A new submicron ion probe systemJournal of Vacuum Science & Technology B, 1983
- 100 keV focused ion beam system with a E×B mass filter for maskless ion implantationJournal of Vacuum Science & Technology B, 1983
- High-resolution, ion-beam processes for microstructure fabricationJournal of Vacuum Science and Technology, 1979