The effect of substrate growth temperature on deep levels in n-AlxGa1−xAs grown by molecular beam epitaxy

Abstract
The deep level transient spectroscopy (DLTS) technique has been used to study changes in electron trapping centers as a function of substrate growth temperature (550 °C≲Tsub≲675 °C) in n‐Al0.25Ga0.75As Schottky barriers grown by molecular beam epitaxy (MBE). The principal result is a deep level at Ec−0.78 eV which decreases by over an order of magnitude in concentration as the growth temperature is increased from 575 to 675 °C.