Characteristics of the planar plasma source sustained by microwave power

Abstract
This article presents a new configuration of large area planar plasma source whose plasma is sustained by microwave power without the presence of static magnetic fields. The absorbed power is varied from 200 to 2000 W and the power absorption occurs over a large area plasma-quartz window interface. The performance of this plasma source is characterized by the plasma density and electron temperature measurements for the argon discharge within the pressure range 5-200 mTorr. Within the investigated pressure range the source provides a large volume diffusion-controlled plasma with ionic densities above . The microwave modes responsible for the plasma maintenance are also discussed.

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