Picosecond laser sputtering of sapphire at 266 nm
- 13 November 1989
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (20) , 2045-2047
- https://doi.org/10.1063/1.102100
Abstract
We observe that 266 nm laser pulses of 30 ps duration and fluence near 10 J/cm2 causes reproducible surfacesputtering and etching of crystalline sapphire in air. The etching rate for the initial ten pulses is relatively slow, 0.04 μm/pulse, producing a smooth surface of the etched area and a broad‐angle plume emission. After some 20 pulses, the etching rate is dramatically faster, 0.5 μm/pulse, producing a rough etchedsurface and a plume composed of broad‐angle emission as well as a narrow perpendicular jet emission. Micron‐sized depressions can be made on the sapphire with no visible damage or cracking to the surroundings.Keywords
This publication has 11 references indexed in Scilit:
- Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulsesApplied Physics Letters, 1989
- Surface laser damage thresholds determined by photoacoustic deflectionApplied Physics Letters, 1988
- Chemical processing with lasers: Recent developmentsApplied Physics B Laser and Optics, 1988
- Observation of two distinct components during pulsed laser deposition of high T c superconducting filmsApplied Physics Letters, 1988
- Electrostatic collection of debris resulting from 193 nm laser etching of polyimideApplied Physics Letters, 1987
- Spatial and temporal distributions of particulates formed from metallic surfaces by laser vaporizationAnalytical Chemistry, 1986
- Excimer-laser etching of diamond and hard carbon films by direct writing and optical projectionJournal of Vacuum Science & Technology B, 1986
- Laser sputteringNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Laser sputteringNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Laser sputtering. Part II. The mechanism of the sputtering of Al2O3Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1984