Optimal control of rapid thermal annealing in a semiconductor process
- 30 June 2004
- journal article
- Published by Elsevier in Journal of Process Control
- Vol. 14 (4) , 423-430
- https://doi.org/10.1016/j.jprocont.2003.07.005
Abstract
No abstract availableThis publication has 34 references indexed in Scilit:
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