Cathodoluminescence of homogeneous cubic GaN/GaAs(001) layers
- 1 January 1999
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 14 (2) , 161-167
- https://doi.org/10.1088/0268-1242/14/2/010
Abstract
The cathodoluminescence (CL) of cubic (c-) GaN epitaxial layers is investigated at temperatures between 50 K and 300 K. The low temperature CL spectra show three well resolved emission lines (3.26 eV, 3.17 eV and 3.08 eV) which are due to excitonic, donor-acceptor and free to acceptor transitions. Spatially resolved measurements of the intensity of the excitonic emission demonstrate the homogeneity of the layers which are free of microcrystalline inclusions. The room temperature CL of the layers has a full width at half maximum of 56 meV and is due to excitonic recombination as is concluded from the zero-shift of the line position when the excitation intensity is varied over some orders of magnitude. The intensity of a broad emission band at 2.4 eV shows a strong nonlinear variation of the intensity at high excitation levels. Using a rate equation model for the near band edge and the deep 2.4 eV emission we are able to describe the intensity variation of these radiative transitions as a function of the excitation intensity. Depth resolved CL measurements reveal a homogeneous depth distribution of deep recombination centres responsible for the deep 2.4 eV luminescence band.Keywords
This publication has 25 references indexed in Scilit:
- An Accurate Method to Determine the Growth Conditions during Molecular Beam Epitaxy of Cubic GaNMaterials Science Forum, 1998
- Epitaxial growth and optical transitions of cubic GaN filmsPhysical Review B, 1996
- Identification of optical transitions in cubic and hexagonal GaN by spatially resolved cathodoluminescencePhysical Review B, 1996
- Photoluminescence and Raman scattering from GaN layers grown on GaAs and GaP substratesSemiconductor Science and Technology, 1995
- Epitaxial growth of cubic and hexagonal GaN by gas source molecular beam epitaxy using a microwave plasma nitrogen sourceJournal of Crystal Growth, 1994
- Growth of zinc blende-GaN on β-SiC coated (001) Si by molecular beam epitaxy using a radio frequency plasma discharge, nitrogen free-radical sourceJournal of Applied Physics, 1993
- Heteroepitaxial wurtzite and zinc-blende structure GaN grown by reactive-ion molecular-beam epitaxy: Growth kinetics, microstructure, and propertiesJournal of Applied Physics, 1993
- Epitaxial growth and characterization of zinc-blende gallium nitride on (001) siliconJournal of Applied Physics, 1992
- Excitation-power dependence of the near-band-edge photoluminescence of semiconductorsPhysical Review B, 1992
- An investigation of the properties of cubic GaN grown on GaAs by plasma-assisted molecular-beam epitaxyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991