Model for drain current RTS amplitude in small-area MOS transistors
- 30 September 1992
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 35 (9) , 1273-1276
- https://doi.org/10.1016/0038-1101(92)90161-5
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Observation of random telegraph signals: Anomalous nature of defects at the Si/SiO2 interfaceJournal of Applied Physics, 1990
- Random telegraph noise of deep-submicrometer MOSFETsIEEE Electron Device Letters, 1990
- Existence of Double-Charged Oxide Traps in Submicron MOSFET'sJapanese Journal of Applied Physics, 1989
- On the theory of carrier number fluctuations in MOS devicesSolid-State Electronics, 1989
- A physical model for random telegraph signal currents in semiconductor devicesJournal of Applied Physics, 1989
- Noise in solid-state microstructures: A new perspective on individual defects, interface states and low-frequency (1/ƒ) noiseAdvances in Physics, 1989
- Individual oxide traps as probes into submicron devicesApplied Physics Letters, 1988
- 1/f and random telegraph noise in silicon metal-oxide-semiconductor field-effect transistorsApplied Physics Letters, 1985
- Discrete Resistance Switching in Submicrometer Silicon Inversion Layers: Individual Interface Traps and Low-Frequency (?) NoisePhysical Review Letters, 1984
- Theory of low frequency noise in Si MOST'sSolid-State Electronics, 1970