Stability of thecenter in GaAs under electron-hole recombination conditions
- 15 September 1986
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 34 (6) , 4358-4359
- https://doi.org/10.1103/physrevb.34.4358
Abstract
We report a study of the effects of electron-hole recombination on the stability of the center in GaAs. In addition to possible recombination-enhanced diffusion, we have examined the effects of recombination on the low-temperature metastable optical properties of the center. No defect migration or annealing was observed, and no changes in metastable properties were evident for diode injection currents up to 60 A at temperatures up to 400°C. The implications of these results with respect to the identity of the defect are discussed.
Keywords
This publication has 26 references indexed in Scilit:
- Recombination enhanced defect annealing in n-InPApplied Physics Letters, 1984
- Recombination-Enhanced Reactions in SemiconductorsAnnual Review of Materials Science, 1982
- Interstitial boron in silicon: A negative-systemPhysical Review B, 1980
- Recombination-enhanced migration of interstitial aluminum in siliconPhysical Review B, 1979
- Recombination enhanced defect reactionsSolid-State Electronics, 1978
- Enhanced diffusion mechanismsRadiation Effects, 1978
- II. Non-radiative processes in insulators and semiconductorsPhilosophical Magazine, 1977
- Recombination-enhanced annealing of the E1 and E2 defect levels in 1-MeV-electron–irradiated n-GaAsJournal of Applied Physics, 1976
- Observation of athermal defect annealing in GaPApplied Physics Letters, 1976
- Observation of Recombination-Enhanced Defect Reactions in SemiconductorsPhysical Review Letters, 1974