Status of Cat-CVD (Hot-Wire CVD) research in Europe

This publication has 32 references indexed in Scilit:

• Higher efficiency of n-i-p solar cells by Hot-Wire CVD at moderate temperatures
  MRS Proceedings, 2001
• N-Type Silicon Films Produced by Hot Wire Technique
  MRS Proceedings, 2000
• Low Temperature Poly-Si Layers Deposited by Hot Wire CVD Yielding a Mobility of 4.0 cm2V−1s−1 in Top Gate Thin Film Transistors
  MRS Proceedings, 2000
• Nanocrystalline Undoped Silicon Films Produce by Hot Wire Plasma Assisted Technique
  MRS Proceedings, 2000
• Doping of amorphous and microcrystalline silicon films by hot-wire CVD and RFPECVD at low substrate temperatures on plastic substrates
  MRS Proceedings, 2000
• Transistors with a Profiled Active Layer Made by Hot-Wire Cvd
  MRS Proceedings, 1998
• Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon
  Journal of Applied Physics, 1989
• Catalytic Chemical Vapor Deposition (CTL-CVD) Method to Obtain High Quality Amorphous Silicon Alloys
  MRS Proceedings, 1988
• Catalytic Chemical Vapor Deposition (CTC–CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
  Japanese Journal of Applied Physics, 1986
• Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2
  Applied Physics Letters, 1985