The step coverage of CVD SiO2 glass films
- 30 June 1982
- journal article
- Published by Elsevier in Materials Letters
- Vol. 1 (1) , 29-32
- https://doi.org/10.1016/0167-577x(82)90035-0
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- The Deposition of Silicon Dioxide Films at Reduced PressureJournal of the Electrochemical Society, 1979
- Advances in deposition processes for passivation filmsJournal of Vacuum Science and Technology, 1977
- A Scanning Electron Microscope Investigation of Glass Flow in MOS Integrated Circuit FabricationJournal of the Electrochemical Society, 1974
- Processes for multilevel metallizationJournal of Vacuum Science and Technology, 1974
- Evaporated film profiles over steps in substratesThin Solid Films, 1970
- Structural Evaluation of Silicon Oxide FilmsJournal of the Electrochemical Society, 1965
- Evidence for Oxidation Growth at the Oxide-Silicon Interface from Controlled Etch StudiesJournal of the Electrochemical Society, 1964