PECVD grown silicon nitride AR coatings on polycrystalline silicon solar cells
- 31 March 1992
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 26 (1-2) , 27-35
- https://doi.org/10.1016/0927-0248(92)90123-7
Abstract
No abstract availableKeywords
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- Reactive Plasma Deposited Si-N Films for MOS-LSI PassivationJournal of the Electrochemical Society, 1978