Theoretical studies on the core structure of the 450 °C oxygen thermal donors in silicon
- 15 May 1992
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 45 (20) , 11612-11626
- https://doi.org/10.1103/physrevb.45.11612
Abstract
Results of molecular- and cyclic-cluster calculations using semiempirical Hamiltonians on a wide range of small oxygen complexes in crystalline silicon are reported. It is shown that a core involving (at most) two oxygens and a self-interstitial can explain the observed behavior of the thermal-double-donor complexes arising in silicon after heat treatment around 450 °C, while all other oxygen complexes proposed so far can be excluded as the core of these centers.Keywords
This publication has 79 references indexed in Scilit:
- Thermal double donors in siliconApplied Physics A, 1989
- Photoluminescence studies of defects in annealed Czochralski siliconCanadian Journal of Physics, 1989
- Enhanced thermal donor formation in silicon exposed to a hydrogen plasmaSemiconductor Science and Technology, 1988
- Thermal donors in silicon: oxygen clusters or self-interstitial aggregatesJournal of Physics C: Solid State Physics, 1985
- Infrared spectroscopic study of thermal donors in Czochralski-grown silicon developed at 450°CMaterials Letters, 1983
- Spectroscopic studies of 450° C thermal donors in siliconPhysica B+C, 1983
- The oxygen related donor effect in siliconPhysica B+C, 1983
- Influence of oxygen on silicon resistivityJournal of Applied Physics, 1980
- Electrical and infrared spectroscopic investigations of oxygen-related donors in siliconPhysica Status Solidi (a), 1979
- Mechanism of the Formation of Donor States in Heat-Treated SiliconPhysical Review B, 1958