Texture of IBAD TiN films as a function of ion-beam intensity and angular incidence
- 31 October 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 84 (1-3) , 443-447
- https://doi.org/10.1016/s0257-8972(95)02747-5
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Growth of thin films with preferential crystallographic orientation by ion bombardment during depositionSurface and Coatings Technology, 1994
- Competition between strain and interface energy during epitaxial grain growth in Ag films on Ni(001)Journal of Materials Research, 1994
- On the residual stress and picostructure of titanium nitride films—II. A picostructural modelVacuum, 1994
- Effects of strain energy on the preferred orientation of TiN thin filmsJournal of Applied Physics, 1993
- Average energy deposited per atom: A universal parameter for describing ion-assisted film growth?Applied Physics Letters, 1993
- Ion bombardment during thin film deposition and its influence on mechanical and chemical surface propertiesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Equipment for ion beam assisted depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Atomic chemical composition and reactivity of the TiC(111) surfaceSurface Science, 1985
- Ion-beam-induced texture formation in vacuum-condensed thin metal filmsThin Solid Films, 1982