Growth of thin films with preferential crystallographic orientation by ion bombardment during deposition
- 31 December 1994
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 65 (1-3) , 90-105
- https://doi.org/10.1016/s0257-8972(94)80014-6
Abstract
No abstract availableKeywords
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