Highly C-Axis-Oriented Pb(Zr, Ti)O3 Films Prepared by Sputtering
- 1 September 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (9S)
- https://doi.org/10.1143/jjap.30.2155
Abstract
A newly developed tripole magnetron sputtering system, which has a third magnetic pole, has been applied to deposit PZT films in the atomic layer epitaxy mode. A set of experimental results revealed that the resultant films were highly c-axis orientated on (100) MgO substrates and that the deviation from stoichiometry in the films enhanced asymmetric properties of the P-E loop patterns.Keywords
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