Variety Transformation of Compound at GaSb Surface under Sulfur Passivation
- 1 December 1998
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 37 (12B) , L1543-1545
- https://doi.org/10.1143/jjap.37.l1543
Abstract
An elemental Sb layer, formed at the oxide/GaSb interface, causes large surface leakage current and recombination, which are two main drawbacks of GaSb-based devices in full photoelectric application. The proportion of elemental Sb to other Sb compounds at the GaSb surface was increased by immersing the sample into diluted HCl solution. With sulfuring of the GaSb surface, elemental Sb was replaced by Sb2S5 and Sb oxides were removed. The mechanism that prevents formation of the leakage path at the as-etched GaSb surface is elucidated by X-ray photoelectron spectroscopy (XPS).Keywords
This publication has 14 references indexed in Scilit:
- Improved photoluminescence from electrochemically passivated GaSbSemiconductor Science and Technology, 1997
- Photoelectric properties of GaSb Schottky diodesJournal of Applied Physics, 1997
- Effects of Sulfur Passivation of GaSb on the Thermal Stability of Al/n-GaSb ContactsJapanese Journal of Applied Physics, 1996
- Current transport properties of metal/hydrogenated amorphous silicon/GaSb structuresApplied Physics Letters, 1995
- Effect of ruthenium passivation on the optical and electrical properties of gallium antimonideJournal of Applied Physics, 1995
- Optical and electrical properties of hydrogen-passivated gallium antimonidePhysical Review B, 1995
- Improvement of dark current of Ga(A1)Sb mesa diodes using (NH4)2S treatmentMaterials Science and Engineering: B, 1994
- Hydrogen passivation effects in quaternary solid solutions of InGaAsSb lattice matched to GaSbMaterials Science and Engineering: B, 1994
- Passivation of GaSb by sulfur treatmentJournal of Electronic Materials, 1994
- Chemical Depth Profile of Thermal Oxide on GaSb Using XPS MethodJapanese Journal of Applied Physics, 1984