The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100} (2x1)-C2H4
Open Access
- 26 November 1999
- journal article
- Published by IOP Publishing in New Journal of Physics
- Vol. 1 (1) , 20
- https://doi.org/10.1088/1367-2630/1/1/320
Abstract
Using the technique of photoelectron diffraction in the scanned energy mode we show that the Si dimer separation on the Si{100} surface following the adsorption of ethene (ethylene) is 2.36(±0.21) Å. This value is only very slightly larger than on the clean surface and shows that the dimer remains intact, thus providing a clear quantitative experimental resolution of a long controversy in the literature. The C-C and C-Si separations are 1.62±0.08 Å and 1.90±0.01 Å, respectively, the former indicating a bond order of less than one.Keywords
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