Resistance Calculation from Mask Artwork Data by Finite Element Method
- 1 January 1985
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Resistance Extraction from Mask Layout DataIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1983
- A Layout Verification System for Analog Bipolar Integrated CircuitsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1983
- Symbolic Parasitic Extractor for Circuit Simulation (SPECS)Published by Institute of Electrical and Electronics Engineers (IEEE) ,1983
- Potential Distribution and Multi-Terminal DC Resistance Computations for LSI TechnologyIBM Journal of Research and Development, 1979
- A boundary technique for calculation of distributed resistanceIEEE Transactions on Electron Devices, 1970
- Messung des übergangswiderstandes zwischen metall und diffusionsschicht in Si-planarelementenSolid-State Electronics, 1969
- Resistance calculations for thin film patternsThin Solid Films, 1968
- Computation of Impedance and Attenuation of TEM-Lines by Finite Difference MethodsIEEE Transactions on Microwave Theory and Techniques, 1965
- The Numerical Solution of Some Important Transmission-Line ProblemsIEEE Transactions on Microwave Theory and Techniques, 1965