Chemisorption of atomic and molecular oxygen on the (100) surface of silicon; a theoretical study
- 3 October 1985
- journal article
- Published by Elsevier in Surface Science
- Vol. 162 (1-3) , 230-238
- https://doi.org/10.1016/0039-6028(85)90900-8
Abstract
No abstract availableKeywords
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