The interaction of oxygen with clean silicon surfaces
- 1 January 1958
- journal article
- Published by Elsevier in Journal of Physics and Chemistry of Solids
- Vol. 4 (1-2) , 91-100
- https://doi.org/10.1016/0022-3697(58)90198-7
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- The High Temperature Oxidation of SiliconThe Journal of Physical Chemistry, 1957
- Ultra-High Vacuum ValveReview of Scientific Instruments, 1955
- On the Logarithmic Rate Law in Chemisorption and OxidationThe Journal of Chemical Physics, 1955
- Determination of Adsorption Energy Heterogeneity of Solid SurfacesThe Journal of Chemical Physics, 1954
- New Developments in the Production and Measurement of Ultra High VacuumJournal of Applied Physics, 1953
- Lattice Parameters, Coefficients of Thermal Expansion, and Atomic Weights of Purest Silicon and GermaniumJournal of Applied Physics, 1952
- Die Untersuchung dünner absorbierender Schichten mit Hilfe der absoluten PhaseThe European Physical Journal A, 1951
- The adsorption of gases on copper filmsDiscussions of the Faraday Society, 1950
- Untersuchungen über den Aufbau aufgedampfter Metallschichten mittels Übermikroskop und ElektroneninterferenzenColloid and Polymer Science, 1942
- Catalytic activity, crystal structure and adsorptive properties of evaporated metal filmsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1940