Control of nitrogen incorporation in ZnTe:N grown by molecular-beam epitaxy using Ar dilution in a N plasma source

Abstract
The use of Ar dilution in a N plasma source has been used to achieve control of both electrical and optical properties of p‐type ZnTe:N grown by molecular‐beam epitaxy. Photoluminescence data are presented that show the transition from ‘‘pure’’ ZnTe emission to that indicative of heavily N‐doped ZnTe. A new principal bound‐exciton line associated with N impurities is observed at 2.3685 eV. An anomalous red shift in the corresponding donor‐acceptor pair peak energy with increasing N concentration is observed at high N concentration and is attributed to the effects of N impurity banding. Trends in p‐type conductivity confirmed the ability to control hole concentrations using Ar dilution.