Preparation and properties of microcrystalline silicon films using photochemical vapor deposition
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 715-718
- https://doi.org/10.1016/0022-3093(83)90271-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Optical and electrical properties of amorphous silicon films prepared by photochemical vapor depositionApplied Physics Letters, 1983
- Silicon Thin-Film Formation by Direct Photochemical Decomposition of DisilaneJapanese Journal of Applied Physics, 1983
- Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H FilmsJapanese Journal of Applied Physics, 1980
- Properties of heavily doped GDSi with low resistivityJournal of Non-Crystalline Solids, 1979