Heterogeneous kinetics and mass transport in chemical vapour deposition processes: Part II application to silicon epitaxy
- 31 December 1981
- journal article
- Published by Elsevier in Progress in Crystal Growth and Characterization
- Vol. 4 (3) , 283-296
- https://doi.org/10.1016/0146-3535(81)90006-x
Abstract
No abstract availableKeywords
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