Electrical characterization of semiconductor materials and devices using scanning probe microscopy
- 6 February 2001
- journal article
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 4 (1-3) , 71-76
- https://doi.org/10.1016/s1369-8001(00)00174-8
Abstract
No abstract availableKeywords
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- Conducting atomic force microscopy for nanoscale electrical characterization of thin SiO2Applied Physics Letters, 1998
- Cross-sectional nano-spreading resistance profilingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- High resolution Fowler-Nordheim field emission maps of thin silicon oxide layersApplied Physics Letters, 1996