Self-diffusion of silicon in thin films of cobalt, nickel, palladium and platinum silicides
- 1 July 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 141 (1) , 41-51
- https://doi.org/10.1016/0040-6090(86)90317-2
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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