Strain relief by In-doping and its effect on the surface and on the interface structures in (Al)GaN on sapphire grown by metalorganic vapor-phase epitaxy
- 1 June 2000
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 159-160, 414-420
- https://doi.org/10.1016/s0169-4332(00)00087-8
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Improvements of the Optical and Electrical Properties of GaN Films by Using In-doping Method During GrowthJapanese Journal of Applied Physics, 1999
- Stress and Defect Control in GaN Using Low Temperature InterlayersJapanese Journal of Applied Physics, 1998
- Improved quality GaN grown by molecular beam epitaxy using In as a surfactantApplied Physics Letters, 1998
- Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaNJapanese Journal of Applied Physics, 1998
- Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase EpitaxyJapanese Journal of Applied Physics, 1997
- Optical Properties of Strained AlGaN and GaInN on GaNJapanese Journal of Applied Physics, 1997
- Interactions of in atoms with partial dislocations cores in GaAs: 0.3% InPhilosophical Magazine Letters, 1989
- Te and Cd nuclear-magnetic-resonance study of local structure and bonding in TePhysical Review B, 1987
- Structural quality ofTe: Equilibrium point defectsPhysical Review B, 1985
- Impurity effect on grown-in dislocation density of InP and GaAs crystalsJournal of Applied Physics, 1978