Performances of Nano/Amorphous Silicon Films Produced by Hot Wire Plasma Assisted Technique
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Transport properties of doped silicon oxycarbide microcrystalline films produced by spatial separation techniquesSolar Energy Materials and Solar Cells, 1996
- On the a-Si:H film growth: the role of the powder formationJournal of Non-Crystalline Solids, 1996
- Fast Deposition of Polycrystalline Silicon Films by Hot-Wire CVDMRS Proceedings, 1995
- Polycrystalline silicon films obtained by hot-wire chemical vapour depositionApplied Physics A, 1994
- Chemical induction effects: O-incorporation in, and substitutional doping of a-Si:HJournal of Non-Crystalline Solids, 1991
- Catalytic Chemical Vapor Deposition (CTC–CVD) Method Producing High Quality Hydrogenated Amorphous SiliconJapanese Journal of Applied Physics, 1986