The effect of rapid thermal annealing in vacuum on the properties of thin SiO2films
- 14 May 1995
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 28 (5) , 906-913
- https://doi.org/10.1088/0022-3727/28/5/012
Abstract
No abstract availableThis publication has 32 references indexed in Scilit:
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