Highly Preferred [111] Texture in Al Films Deposited on Ultrathin Metal Underlayers
- 1 September 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (9A) , L1280
- https://doi.org/10.1143/jjap.31.l1280
Abstract
Al films on ultrathin metal underiayers 1-100 Å thick were fabricated on quartz and thermally oxidized Si substrates by the ion beam sputtering (IBS) technique. These Al films showed a highly preferred [111] texture and flat surfaces, as compared with the Al films deposited directly on the substrates. The texture in these Al films was related to the buffer layer structure and Al structure at the beginning of deposition. The metal underlayer textured into a double-rotated symmetry prevented the [111] texture of Al. The highly textured Al films had an amorphouslike structure at the beginning of Al deposition.Keywords
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