Potentiometry Combined with Atomic Force Microscope
- 1 November 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (11A) , L1562-1564
- https://doi.org/10.1143/jjap.33.l1562
Abstract
We have presented a novel method for surface potential measurement based on an atomic force microscope operating under the contact mode. This method is precise and exhibits sub-mV accuracy for potential measurement as well as nanometer-order spatial resolution. We show, for the first time, simultaneous measurements of the surface potential and surface actual topography on an ion-implanted silicon substrate with inhomogeneity of surface conductance.Keywords
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