Determination of the diffusing species and mechanism of diffusion during CrSi2 formation, using 31Si as a marker

1 March 1982

journal article
research article
Published by AIP Publishing in Applied Physics Letters

Vol. 40 (5) , 412-414
https://doi.org/10.1063/1.93122

Abstract

Both the diffusing atomic species and its mechanism of diffusion have been directly determined during metal‐silicon interaction to form CrSi₂. By using radioactive ³¹Si (half‐life = 2.62h) as a marker, it has been shown that silicon is the diffusing species during CrSi₂ formation and that it diffuses by a substitutional (vacancy) mechanism. Complete intermixing of radioactive ³¹Si and nonradioactive silicon was found to take place throughout the silicide layer at its formation temperature, due to high substitutional (vacancy) self‐diffusion of silicon in CrSi₂.

Keywords

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