Stability of the structure of dielectric films on silicon
- 1 February 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 66 (1) , 85-90
- https://doi.org/10.1016/0040-6090(80)90074-7
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Shock crystallization in amorphous films of dielectricsSurface Science, 1979
- The structure of silicon nitride films. II. Non-stoichiometric silicon nitridePhysica Status Solidi (a), 1979
- The structure of silicon nitride films I. Stoichiometric silicon nitridePhysica Status Solidi (a), 1978
- Transition regions in epitaxially grown semiconductor films and devicesThin Solid Films, 1978
- Structure, optical and electrical properties of silicon-rich silicon nitride filmsThin Solid Films, 1976
- Formation of structure in polysilicon filmsThin Solid Films, 1976
- Local Crystallization of Thermal Oxide Film of SiliconJapanese Journal of Applied Physics, 1971